发明名称 Method of making thin film transistors
摘要 A thin film field effect transistor includes: a) a thin film channel region; b) a pair of opposing electrically conductive first and second source/drain regions adjacent the thin film channel region; c) a gate insulator and a gate positioned adjacent the thin film channel region for electrically energizing the channel region to switch on the thin film field effect transistor; d) the first source/drain region having a first thickness, the second source/drain region having a second thickness, the channel region having a third thickness; at least one of the first and second thicknesses being greater than the third thickness. Methods are disclosed for making thin field effect transistors.
申请公布号 US5858821(A) 申请公布日期 1999.01.12
申请号 US19960706641 申请日期 1996.09.05
申请人 MICRON TECHNOLOGY, INC. 发明人 DENNISON, CHARLES H.;MANNING, MONTE
分类号 H01L21/336;H01L21/8244;H01L27/11;H01L29/786;(IPC1-7):H01L21/336 主分类号 H01L21/336
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