发明名称 X-RAY CATOPTRIC SYSTEM
摘要 PROBLEM TO BE SOLVED: To enable the irradiation of objects with highly intense and uniform X rays in a large area by composing an optical system of a plane mirror and a nonplanar mirror and using for the latter the one whose surface form is described by a polynomial expression including a cubic or higher term. SOLUTION: X rays 2 radiated from an X-ray source 1 are incident on a nonplanar mirror 3 at an incidence angleθ1 and are reflected in compliance with the law of regular reflection. Then, the X rays 2 are incident on a plane mirror 4 at an incidence angleθ2 (the same angle as the reflection angle), are regularly reflected by it and are projected on an irradiation surface 5. On this occasion, an X-ray optical system can be composed that combines both high intensity, the irradiation of a large area and the uniformity of high intensity by setting the geometry of the nonplanar mirror 3 described by a function where at least one term includes a term expressed by 1+n+n>=3 in a linear combination of x<1> , y<m> and z<n> when space coordinates are represented by x, y and z. Moreover, the use of the plane mirror 4 for one of the two mirrors can facilitate working and lower the price of it to realize the low price of the whole optical system.
申请公布号 JPH116898(A) 申请公布日期 1999.01.12
申请号 JP19970161212 申请日期 1997.06.18
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 ITABASHI SEIICHI
分类号 G21K1/06;H01L21/027;H05H13/04;(IPC1-7):G21K1/06 主分类号 G21K1/06
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