| 摘要 |
PROBLEM TO BE SOLVED: To prevent a pattern from being deformed by a method wherein a light source is changed in form, and a transparent auxiliary pattern where the phase difference of a transmitted light is equal to that of a transparent region is arranged at a main pattern which is to be projected. SOLUTION: A region 72 semitransparent to an exposure light and a transparent region to become a main pattern 73 are included, the semitransparent region 72 is so regulated as to reverse a phase difference between light which passes through the semitransparent region 72 and another light which passes through the transparent region, and the main pattern 73 is recurrently arranged. The recurrent pitch of the main pattern 73 is set 3.2 or less times as large as the size of the main pattern 73. Furthermore, an auxiliary pattern 74 which is a transparent auxiliary aperture and whose one side is smaller in size than the resolution limit of the projection optical system of a projection aligner is arranged so as to correct the main pattern 73 on form. By this setup, a fine pattern can be prevented from being deformed, and a hole pattern can be arranged high in density with an enough margin. |
