发明名称 PRODUCTION OF CUBIC NITRIDED BORON COATING FILM
摘要 PROBLEM TO BE SOLVED: To produce the cubic nitrided boron coating film of high hardness on a substrate by generating an arc discharge with boron as a cathode, guiding a boron ion generated to an annular magnetic field of an electromagnetic coil and adhering on a substrate surface in presence of a nitrogen ion. SOLUTION: A boron cathode 11, in which C, Ca, etc., as impurities are added in <=5 wt.%, is mounted in a hollow ceramic heater 13, an arc discharge cathode 15 is obtained. This is arranged in the device having a high vacuum of about 5×10<-5> Torr, the boron cathode 11 is heated up to >=400 deg.C, preferably >=500 deg.C. Successively, an arc discharge is generated between a cathode 15 and an annular anode 17 through a trigger electrode 16. A boron ion 19 generated from the boron cathode 11, while separating a non charged fused material 20 from thereof, is guided to a substrate 21 through a deflection coil 22 and is allowed to reacted with the nitrogen gas on the surface, introduced from a supply pipe 24, a C-BN coating film excellent in wear resistance is adhered/ formed on a substrate surface.
申请公布号 JPH116052(A) 申请公布日期 1999.01.12
申请号 JP19970156760 申请日期 1997.06.13
申请人 SONY CORP 发明人 SOTOZAKI MINEHIRO
分类号 C23C14/06;C23C14/24;H01L21/203;(IPC1-7):C23C14/06 主分类号 C23C14/06
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