发明名称 III-V compound semiconductor quantum dot production
摘要 In the production of quantum dots of III-V compound semiconductor in the Stranski-Krastanow growth mode by MOCVD, the novelty is that, after epitaxy of the quantum dots during growth interruption by switching off the group III component, the group V component process gas is also switched off. Preferably, the quantum dots consist of two InxGa1-xAs layers, the first having an In concentration (x) of 0.3-1.0 and the second having the same or lower In concentration, and, after deposition of the second layer, a second growth interruption is provided before epitaxy of further cover layers.
申请公布号 DE19726989(A1) 申请公布日期 1999.01.07
申请号 DE1997126989 申请日期 1997.06.25
申请人 HEINRICHSDORFF, FRANK, 10997 BERLIN, DE;KROST, ALOIS, DR., 13587 BERLIN, DE;BIMBERG, DIETER, PROF. DR., 14089 BERLIN, DE 发明人 HEINRICHSDORFF, FRANK, 10997 BERLIN, DE;KROST, ALOIS, DR., 13587 BERLIN, DE;BIMBERG, DIETER, PROF. DR., 14089 BERLIN, DE
分类号 H01L21/20;H01L21/205;H01S5/34;H01S5/343;(IPC1-7):H01L21/205;H01S3/19;C30B25/02 主分类号 H01L21/20
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