发明名称 |
Semiconductor device especially bipolar transistor |
摘要 |
A semiconductor device has (a) a first conductivity type dopant region (8, 10), part of which is exposed at a semiconductor substrate (20) surface; (b) a second conductivity type dopant region (13) which is surrounded by the first conductivity type dopant region (8, 10) and part of which is exposed at the substrate surface; (c) first and second electrodes (5, 12) connected to the exposed surfaces of the first and second conductivity type dopant regions, respectively; and (d) an insulating layer (23) sandwiched between the first and second electrodes, the upper end of an adjoining region (22) of the first electrode (5), which is directed towards the second electrode (12), being cut away. Also claimed is a process for producing the above semiconductor device.
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申请公布号 |
DE19802596(A1) |
申请公布日期 |
1999.01.07 |
申请号 |
DE19981002596 |
申请日期 |
1998.01.23 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP |
发明人 |
YOSHIHISA, YASUKI, TOKIO/TOKYO, JP |
分类号 |
H01L21/28;H01L21/331;H01L21/768;H01L29/73;H01L29/732;(IPC1-7):H01L29/735 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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