| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition having excellent developability with an alkaline developing solution and being desirable as a material for sandblast having a sufficient resolution even in a thickness of 20μm or above and having excellent sandblast resistance, excellent adhesion to the substrate to be treated and excellent release from the substrate to be treated after curing and to provide a photosensitive dry film using the same. SOLUTION: This composition comprises an alkali-soluble copolymer comprising structural units derived from a carboxylcontaining radical-polymerizable compound, structural units derived from a conjugated diolefin compound and structural units derived from another radical-polymerizable compound, an urethane poly(meth)acrylate compound having at least two ethylenic unsaturations and a radical photopolymerization initiator.
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