发明名称 CVD APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To make the entire part of a structure simpler and lower in cost. SOLUTION: This laser CVD apparatus 1 has chamber having a work mounting stage 7 for mounting a work M and an X-Y stage 8 for moving and operating this work mounting stage 7 therein and a gas supplying unit having a nozzle section 4 for supplying gaseous raw material into this chamber. In such a case, a driving mechanism 5 having an expansion and contraction element 11 for moving and operating the work mounting stage 7 within the stroke between the nozzle section 4 and the X-Y stage 8 is disposed in the chamber. The expansion and contraction element 11 of the driving mechanism 5 comprises the expansion and contraction element having a shape memory alloy element 13 which moves and operates the work mounting stage 7 to either side of the nozzle section 4 or the X-Y stage 8 by thermal deformation and springs 14 which move and operate the work mounting stage 7 in the direction opposite to the moving and operating direction by this shape memory alloy element 13.</p>
申请公布号 JPH111774(A) 申请公布日期 1999.01.06
申请号 JP19970153918 申请日期 1997.06.11
申请人 NEC CORP 发明人 UEDA ATSUSHI
分类号 C23C16/44;G03F1/72;H01L21/205;(IPC1-7):C23C16/44;G03F1/08 主分类号 C23C16/44
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