发明名称 LIQUID TREATMENT DEVICE AND LIQUID TREATMENT METHOD
摘要 <p>PROBLEM TO BE SOLVED: To reduce burden on a plant exhaust system, by circulating and reusing an atmosphere in a liquid treatment device enclosed with a casing, without discharging to the plant exhaust system, etc. SOLUTION: Atmospheres in a casing 61 of a development process device DEV1 and a casing 71 of a resist liquid coating device COT1 are introduced from an exhaust pipe 81 through an introduction pipe 50 into a filter device 101. The air cleaned and controlled in temperature and relative humidity in the filter device 101 containing a liquid-vapor contact space is returned from a delivery pipe 51 through a wall duct 46 to the inside of the casings 61 and 71.</p>
申请公布号 JPH113851(A) 申请公布日期 1999.01.06
申请号 JP19970169552 申请日期 1997.06.11
申请人 TOKYO ELECTRON LTD 发明人 SENBA NORIO;KITANO JUNICHI;KATANO TAKAYUKI
分类号 G03F7/16;B01D53/14;B05B15/12;B05C11/08;G03F7/30;H01L21/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/16
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