| 摘要 |
PROBLEM TO BE SOLVED: To obtain a color filter base plate having aptitude for mass- productivity and dispensing with a complicated process by executing resist patterning and transference electrode patterning with a color filter as a mask after installing the transference electrode on the color filter and applying a photoresist thereto. SOLUTION: This color filter is provided with a back stripe(BM) part in addition to red(R), green(G) and blue(B) or cyan(C), magenta(M) and yellow(Y) pixel stripes. The negative photoresist is installed on the transference electrode and electromagnetic wave is radiated to the photoresist from the surface on an opposite side to the transference electrode installed surface of a transparent base plate with the color filter as the mask. Then, pattern-exposure is performed so that the picture element stripe part may be an exposed part and the black matrix part may be an unexposed part in substance, and developing processing, etching processing and resist-peeling processing are performed. |
