| 摘要 |
PROBLEM TO BE SOLVED: To realize an oblique illumination technique without altering illumination system of an aligner. SOLUTION: A region of a second surface 13b opposite to a surface where a specified pattern 15 of a photomask 11 is formed, facing at least a light transmission part 15b in the specified pattern 15, is provided with a light diffracting pattern 17. The light diffracting pattern 17 is a pattern provided with one or more light-shielding parts 17a of the size, which is so selected as not to be resolved within at least a focus depth of the specified pattern 15. And exposure is performed through the photomask 11 provided with the light diffracting pattern 17. |
