发明名称 Water-resistant protective overcoat for AgX photographic system
摘要 The present invention is an imaged photographic element having a protective overcoat thereon. The protective overcoat formed by the steps of providing a photographic element having at least one silver halide light-sensitive emulsion layer; applying a coating comprising hydrophobic polymer particles having an average size of 0.01 to 1 microns, a melting temperature of from 55 DEG to 200 DEG C. at a weight percent of 30 to 95, and gelatin at a weight percent of 5 to 70 over the at least one silver halide light-sensitive emulsion layer. The silver halide light sensitive emulsion layer is developed to provide an imaged photographic element. The hydrophobic polymer particles are then fused to form a protective overcoat. In an alternate embodiment the coating further includes water soluble polymer materials at a weight percent of from 5 to 45.
申请公布号 US5856051(A) 申请公布日期 1999.01.05
申请号 US19970898985 申请日期 1997.07.23
申请人 EASTMAN KODAK COMPANY 发明人 YAU, HWEI-LING;KRZEMIEN, WENDY S.;LANDRY-COLTRAIN, CHRISTINE J. T.;BOWMAN, WAYNE A.
分类号 G03C1/74;G03C1/76;G03C11/08;(IPC1-7):G03C11/08 主分类号 G03C1/74
代理机构 代理人
主权项
地址