发明名称 |
Water-resistant protective overcoat for AgX photographic system |
摘要 |
The present invention is an imaged photographic element having a protective overcoat thereon. The protective overcoat formed by the steps of providing a photographic element having at least one silver halide light-sensitive emulsion layer; applying a coating comprising hydrophobic polymer particles having an average size of 0.01 to 1 microns, a melting temperature of from 55 DEG to 200 DEG C. at a weight percent of 30 to 95, and gelatin at a weight percent of 5 to 70 over the at least one silver halide light-sensitive emulsion layer. The silver halide light sensitive emulsion layer is developed to provide an imaged photographic element. The hydrophobic polymer particles are then fused to form a protective overcoat. In an alternate embodiment the coating further includes water soluble polymer materials at a weight percent of from 5 to 45.
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申请公布号 |
US5856051(A) |
申请公布日期 |
1999.01.05 |
申请号 |
US19970898985 |
申请日期 |
1997.07.23 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
YAU, HWEI-LING;KRZEMIEN, WENDY S.;LANDRY-COLTRAIN, CHRISTINE J. T.;BOWMAN, WAYNE A. |
分类号 |
G03C1/74;G03C1/76;G03C11/08;(IPC1-7):G03C11/08 |
主分类号 |
G03C1/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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