发明名称 |
Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas |
摘要 |
<p>A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask. The phase-shifting regions may have different transmission coefficients to provide differing degrees of transparency or different degrees of phase shift to provide differing degrees of image intensity. <IMAGE></p> |
申请公布号 |
EP0620498(B1) |
申请公布日期 |
1998.12.30 |
申请号 |
EP19940301927 |
申请日期 |
1994.03.17 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BROCK, PHILLIP JOE;FRANKLIN, JACQLYNN ANN;SCHELLENBERG, FRANKLIN MARK;TSAY, JIUNN |
分类号 |
G03F1/34;G03F7/20;(IPC1-7):G03F1/14 |
主分类号 |
G03F1/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|