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发明名称
METHOD FOR PURGING A MULTI-LAYER SACRIFICIAL ETCHED SILICON SUBSTRATE
摘要
申请公布号
EP0807317(A4)
申请公布日期
1998.12.30
申请号
EP19960942020
申请日期
1996.11.18
申请人
LITTON SYSTEMS, INC.
发明人
WARREN, KEITH, O.
分类号
G01P15/08;G01P15/125;H01L21/306;H01L49/00;(IPC1-7):H01L21/00;B44C1/22
主分类号
G01P15/08
代理机构
代理人
主权项
地址
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