| 摘要 |
A device producing substrate having a depression not passing through the substrate from the front to back formed on the surface of the substrate. The depression preferably has an area of an extent which can be used as a mark for prealignment. The depression preferably is formed at least at part of the outer periphery of the substrate. The depression means any sort of depression not passing through the substrate and is used in a sense including a notch, hollow, hole, etc. In the device producing substrate, it is possible to use a dark-field imaging type microscope with an oblique incidence illumination or a differential interference microscope with an oblique incidence illumination to easily detect the position of the depression and possible to perform pre-alignment based on the result of detection. Further, in this device producing substrate, the depression used for the pre-alignment is formed not to pass through the substrate from the front to back, so less stress concentration occurs compared with a conventional orientation flat or notch. <IMAGE> <IMAGE> |
