QUARTZ GLASS COMPONENT USED IN THE PRODUCTION OF SEMICONDUCTORS

摘要

PCT No. PCT/EP98/01715 Sec. 371 Date Nov. 24, 1998 Sec. 102(e) Date Nov. 24, 1998 PCT Filed Mar. 24, 1998 PCT Pub. No. WO98/44538 PCT Pub. Date Oct. 8, 1998A quartz glass component for use in the manufacture of semiconductors is provided. It has a rough surface which is formed by irregular elevated structural elements which extend between a first, higher plane and a second, lower plane. A plurality of the structural elements has a substantially flat top surface extending in the first plane. This surface is bounded on all sides by facet-like, substantially flat, side surfaces which extend between the first and the second planes. The average surface roughness depth Ra lies between 0.1 mu m and 10 mu m and the size of the structural elements ranges on average between 30 mu m and 180 mu m. The invention provides a quartz glass component particularly suitable for the adhesion of CVD layers and having a long service life.