发明名称 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound
摘要 Provided are a method of synthesizing a highly pure polyphenol compound, which comprises (i) introducing at least one -CHRNR'R'' group onto aromatic ring(s) of a phenol compound having from one to ten aromatic ring(s), wherein R represents a hydrogen atom, an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'', which may be the same or different, each represents an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'' may combine with each other to form a ring, (ii) converting the -CHRNR'R'' group into a -CHRA group via one to three steps, wherein A represents a hydroxyl group, an alkoxy group, an acyloxy group, a halogen atom, a quaternary ammonium salt or a sulfonyloxy group, and (iii) condensing the thus converted phenol compound and a phenol compound, and a positive working photoresist composition using the polyphenol compound obtained by the aforementioned method.
申请公布号 US5853949(A) 申请公布日期 1998.12.29
申请号 US19960657773 申请日期 1996.05.31
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KODAMA, KUNIHIKO;MOMOTA, MAKOTO
分类号 C07C37/11;G03F7/022;(IPC1-7):G03F7/023 主分类号 C07C37/11
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