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发明名称
Reinigungsflüssigkeit für Halbleitersubstrate
摘要
申请公布号
DE69320391(T2)
申请公布日期
1998.12.24
申请号
DE19936020391T
申请日期
1993.03.10
申请人
MITSUBISHI GAS CHEMICAL CO., INC., TOKIO/TOKYO, JP
发明人
SUGIHARA, YASUO, KASHIWA-SHI, CHIBA-KEN, JP;TANAKA, KAZUSHIGE, KATSUSHIKA-KU, TOKYO, JP;SAKUMA, IKUE, KOSHIGAYA-SHI, SAITAMA-KEN, JP
分类号
C11D3/36;C11D3/39;C11D7/36;C11D7/50;H01L21/306;(IPC1-7):C11D3/39
主分类号
C11D3/36
代理机构
代理人
主权项
地址
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