| 摘要 |
<p>The invention relates to a method for removing H2S from off-gases which contain at least 20 % by volume of water vapor, comprising treating the off-gases at a temperature above the water dew point of the off-gases with an aqueous, alkaline solution under absorption of the H2S, followed by subjecting the sulfide-containing solution formed to a biological oxidation of the sulfide.</p> |
