发明名称 |
Positive-working photoresist composition |
摘要 |
A positive-working photoresist composition comprising a water-insoluble alkali-soluble resin, a water-insoluble alkali-soluble low molecular compound, and an ionization-sensitive radioactive compound, said ionization-sensitive radioactive compound comprises a mixture of a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having three phenolic hydroxyl groups as an ionization-sensitive radioactive compound (A) and a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having four phenolic hydroxyl groups as an ionization-sensitive radioactive compound (B) in an amount of 30 % or more by weight based on the total amount of said ionization-sensitive radioactive compound. |
申请公布号 |
EP0886183(A1) |
申请公布日期 |
1998.12.23 |
申请号 |
EP19980114167 |
申请日期 |
1994.12.16 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SATO, KENICHIRO;KAWABE, YASUMASA;AOAI, TOSHIAKI;SAKAGUCHI, SHINJI |
分类号 |
G03F7/022 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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