Apparatus for measuring pedestal temperature in a semiconductor wafer processing system

摘要

Apparatus for measuring wafer support pedestal temperature in a semiconductor wafer processing system. The apparatus measures infrared energy emitted by the bottom of the pedestal 104 via a tube 114 having one end inserted in a bore 108 through the underside of the cathode pedestal base 106. The distal end of the tube is coupled to a temperature sensor 118. Both the tube 114 and temperature sensor 118 are fitted with insulating sleeve adapters 112 and 120 respectively to suppress unwanted RF signals from coupling to the sensor 118. <IMAGE>