发明名称 PHOTOCURABLE COMPOSITION BASED ON ACID FUNCTIONAL, PRIMARY RESINOUS MERCAPTANS
摘要 <p>Acid functional primary thiols having no hydroxy substituents in the beta position, and also having aromatic backbones, can be combined with unsaturated resins to make aqueous base-developable, photoimaging compositions such as solder masks and resists.</p>
申请公布号 WO1998058294(A1) 申请公布日期 1998.12.23
申请号 US1998011871 申请日期 1998.06.08
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址