| 摘要 |
<p>Reducing the step size in a step and repeat process used to E-beam write field by field (11) a grating in a layer of resist (10) so that adjacent fields overlap, whereby two or more fields are employed to write each grating element, delocalises the stepping stitch errors, and thereby reduces their deleterious effect. The resulting increased writing complexity introduces other problems, and hence there is a limit beyond which further increasing the number of fields is no longer beneficial. By suitable grating of the irradiation dose in each field it has been found possible to increase further the delocalisation without further increasing the number of fields employed. <IMAGE></p> |
