PHOTOCURABLE COMPOSITION BASED ON ACID FUNCTIONAL, PRIMARY RESINOUS MERCAPTANS
摘要
Acid functional primary thiols having no hydroxy substituents in the beta position, and also having aromatic backbones, can be combined with unsaturated resins to make aqueous base-developable, photoimaging compositions such as solder masks and resists.
申请公布号
WO9858294(A1)
申请公布日期
1998.12.23
申请号
WO1998US11871
申请日期
1998.06.08
申请人
MACDERMID ACUMEN, INC.;HERR, DONALD, E.;HALLOCK, JOHN, S.
