| 摘要 |
PROBLEM TO BE SOLVED: To further speed up the process for creating mask pattern data for the electron beam writing. SOLUTION: This method comprises a step of extracting line segments not parallel to the Y-axis from an input pattern data (step S1), a step of sorting the end points of each segment in the X-axis (step S2), and a step of performing graphic arithmetic processing for the segment existing between the current and immediately preceding scanning lines while moving the scanning line along the end points (step S3). When another graphic arithmetic processing is performed successively (step S4), the obtained segment is connected if its ID is temporarily recorded in a segment lift 11 (step S5). In the case of last graphic arithmetic processing, the two sets of obtained segments are joined only when the IDs of both sets are recorded temporarily in the lift 11 (step S6). When all the graphic arithmetic processings are finished (step S8), a rectangular/ trapezoidal forming processing is performed based on a segment list 12 (step S9). |
