PROCEDE ET DISPOSITIF DE FOURNITURE DE PLUSIEURS GAZ DE TRAVAIL, ET SON APPLICATION A UNE INSTALLATION D'ASSEMBLAGE DE COMPOSANTS ELECTRONIQUES

摘要

The invention concerns a method for supplying, from a common source of air (13), at least two working gases whereof the limit of O2 content, respectively t1 and t2, are such that t1 is greater than t2. The method consists in: depleting the air in O2 (1) to obtain a first gas mixture with O2 content not more than t1; using part of this first gas mixture to supply (7) the first working gas; depleting another part of this first mixture in O2 (3) to obtain a second gas mixture with O2 content not more than t2; and using this second gas mixture to supply (9) the second working gas.