发明名称 SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress the occurrence of a defective lot by constantly maintaining the treatment performed on all substrates of the lot by respectively setting the treating times of a plurality of treating sections and setting the treating time of a specific type of treating section the treating time of which is to be adjusted to the longest time among the treating time of all treating sections. SOLUTION: In a substrate treating device 1, a treating time setting section 371 sets the treating time of each treating section so as to control the operations of a transfer robot 36. Since a specific kind of treating section which is most important to make the qualities of substrates 9 constant is a post-exposure baking section 31, the treating time of the section 31 is set to the longest time among the treating time of all treating sections. In a plurality of treating sections, in addition, the substrates are taken out after the treating time of the treating sections has elapsed and, at the same time, the substrates from preceding processes are thrown in the sections and taken-out substrates are carried to succeeding processes. Therefore, the qualities of the substrate can be maintained constantly by constantly maintaining the existing time of the substrates in the specific treating section.
申请公布号 JPH10335412(A) 申请公布日期 1998.12.18
申请号 JP19970139760 申请日期 1997.05.29
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NISHIMURA KAZUHIRO;HAMADA TETSUYA
分类号 H01L21/677;H01L21/02;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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