发明名称 SEMICONDUCTOR SUBSTRATE MATERIAL, SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide the semiconductor substrate material, having the thermal conductivity of 100 W/mK or higher and the thermal expansion coefficient of 20&times;10<-6> / deg.C or lower and consisting of Al-SiC composite alloy of light weight and uniform composition, the semiconductor substrate, and semiconductor device using the above-mentioned material, and to provide the manufacturing method of the above-mentioned material, semiconductor substrate and device. SOLUTION: This semiconductor substrate material is composed of an Al-SiC composite alloy which is manufactured by a sintering method, the SiC of 10 to 70 wt.%, which is dispersed in particle-like form, is present in Al or Al alloy, and the difference of SiC quantity in Al-SiC alloy composition should be within 1 wt.%. This semiconductor substrate material is used as the semiconductor substrate of a semiconductor device in the state as it is or by providing the surface treatment such as Al coating layer, etc., on the surface.
申请公布号 JPH10335538(A) 申请公布日期 1998.12.18
申请号 JP19970136164 申请日期 1997.05.09
申请人 SUMITOMO ELECTRIC IND LTD 发明人 YAMAGATA SHINICHI;KOUNO YOSHIE;TAKIGAWA TAKATOSHI;HIROSE YOSHIYUKI;FUKUI AKIRA;ABE YUUGAKU;IMAMURA MAKOTO
分类号 B22F3/24;C22C1/05;C22C1/10;C22C21/00;C22C32/00;C25D17/16;H01L21/48;H01L23/14;H01L23/15 主分类号 B22F3/24
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