| 摘要 |
PROBLEM TO BE SOLVED: To provide the method capable of easily manufacturing the color filter which has superior film hardness, contactness, smoothness, etc., by adopting a thermal transfer method. SOLUTION: After a substrate 31 is coated with a substance 32a for a black matrix, a black matrix pattern 32b is formed through a photolithography process, a transfer film 33 which is arranged on the substrate and contains a 1st thermally transferred color layer is irradiated with light to form a 1st color filter layer 34a on the substrate, and a transfer film which contains a 2nd thermally transferred color layer is irradiated with light to form a 2nd color filter layer 34b on the substrate; and a transfer film which is arranged on the substrate and contains a 3rd thermally transferred color layer is irradiated with light to form a 3rd color filter layer 34c on the substrate, the substrate where the 1st, 2nd, and 3rd color filter layers are formed is set at 200 to 300 deg.C, and a transfer electrode layer 36 is formed on the resulting body. Consequently, the need of a protection film is eliminated since this color filter is superior in contactness, chemical resistance, heat resistance, light resistance, color coordinate characteristics, smoothness, etc. |
