| 摘要 |
PROBLEM TO BE SOLVED: To obtain such a positive photosensitive compsn. that has high resolution without deterioration in sensitivity, that the resist pattern shows no T-top shape with time from exposure to the heat treatment, and that the pattern shows little changes in the line width, by using a specified compd. which produces sulfonic acid. SOLUTION: This compsn. contains a compd. expressed by formula I which produces sulfonic acid by irradiation of active rays or radiation and a resin having groups which are decomposed by the effect of an acid to increase solubility in an alkali developer. In formula I, R1 to R15 are hydrogen atoms, halogen atoms, hydroxyl groups, acylamino groups, t-butoxycarbonyloxy groups, straight- chain, branched or cyclic alkoxy groups, etc., X<-> is a compd. selected from sulfonium anions expressed by formula II. In formula II, n is an integer 0 to 10, R16 to R20 , R21 to R27 , and R28 to R36 are hydrogen atoms, halogen atoms, straight-chain, branched or cyclic alkyl groups, perfluoroalkyl groups, etc. |
