| 发明名称 |
Dimensionally reducing patterns for making I.C.s |
| 摘要 |
A pattern, for example in a photoresist for making an I.C. is dimensionally reduced by applying the pattern to a surface which is subsequently shrunk. The pattern may be applied to a stretched elastic sheet which is then released. Memory alloys or heat shrinkable plastics may alternatively by used. |
| 申请公布号 |
GB2326276(A) |
申请公布日期 |
1998.12.16 |
| 申请号 |
GB19970012001 |
申请日期 |
1997.06.11 |
| 申请人 |
TIMOTHY MICHAEL WILLIAM * FRYER |
发明人 |
TIMOTHY MICHAEL WILLIAM * FRYER |
| 分类号 |
B41M5/00;B41M7/00;G03F1/00;G03F7/00;G03F7/09;G03F7/40;H01L21/027;H01L21/033;(IPC1-7):H01L21/31 |
主分类号 |
B41M5/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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