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发明名称
APPARATUS AND PROCESS FOR TREATING EXHAUSTED GAS
摘要
申请公布号
KR0164529(B1)
申请公布日期
1998.12.15
申请号
KR19960024194
申请日期
1996.06.26
申请人
SAMSUNG ELECTRONICS CO.,LTD
发明人
KIM, HEE-DUK;JUNG, BYUNG-PYO
分类号
B01D53/34;B01D49/02;B01D53/00;B01D53/26;H01L21/205;H01L21/22;H01L21/31;(IPC1-7):B01D47/00
主分类号
B01D53/34
代理机构
代理人
主权项
地址
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