| 摘要 |
An exposure method and apparatus for transferring a pattern of a mask onto a substrate to be exposed, with projection through a projection optical system. The apparatus includes a stage being movable while carrying the substrate thereon, a laser interferometer for measuring a position of the stage, wherein a measurement position of a laser beam of the laser interferometer deviates relative to a focal plane of the projection optical system, with respect to a direction of an optical axis of the projection optical system, a memory for memorizing, with respect to each of different positions of the stage, information related to an Abbe error produced in accordance with the deviation of the focal plane and the measurement position of the laser interferometer, and a controller for controlling the stage on the basis of a corrected value corresponding to a measured value of the laser interferometer as corrected by the Abbe error.
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