发明名称 RF plasma reactor and methods of generating RF plasma
摘要 A plasma reactor includes a pair of parallel plate electrodes (1,2) one of which is grounded and the other driven, mounted within a chamber (8) which is connected via a port (8a) to a control device (16) for controlling the pressure of the gas within the chamber (8). The driven electrode (1) is connected to a voltage supply which has a driving frequency of 13.56 MHz, via an amplifier (9) and a superposed higher resonance frequency via a variable frequency power generator (11). With the plasma reactor sheath resonance in the glow discharge between the electrodes (1,2) can be generated to have a standing wave and thereby ensuring a greater coupling of the power in the system.
申请公布号 US5849372(A) 申请公布日期 1998.12.15
申请号 US19960617395 申请日期 1996.03.18
申请人 ISIS INNOVATION LIMITED 发明人 ANNARATONE, BEATRICE MARIA;ALLEN, JOHN EDWARD
分类号 H01J37/32;(IPC1-7):H05H1/00 主分类号 H01J37/32
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