发明名称 |
RF plasma reactor and methods of generating RF plasma |
摘要 |
A plasma reactor includes a pair of parallel plate electrodes (1,2) one of which is grounded and the other driven, mounted within a chamber (8) which is connected via a port (8a) to a control device (16) for controlling the pressure of the gas within the chamber (8). The driven electrode (1) is connected to a voltage supply which has a driving frequency of 13.56 MHz, via an amplifier (9) and a superposed higher resonance frequency via a variable frequency power generator (11). With the plasma reactor sheath resonance in the glow discharge between the electrodes (1,2) can be generated to have a standing wave and thereby ensuring a greater coupling of the power in the system.
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申请公布号 |
US5849372(A) |
申请公布日期 |
1998.12.15 |
申请号 |
US19960617395 |
申请日期 |
1996.03.18 |
申请人 |
ISIS INNOVATION LIMITED |
发明人 |
ANNARATONE, BEATRICE MARIA;ALLEN, JOHN EDWARD |
分类号 |
H01J37/32;(IPC1-7):H05H1/00 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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