| 摘要 |
PROBLEM TO BE SOLVED: To decide a number of revolutions of a dressing plate by a specified formula based on the number of revolutions of a abrasive cloth by using the dressing plate in which an annular dressing material having a diameter or more enough to allow movement of a wafer is embedded, and to uniformalize a dressing amount by reverse rotation to rotation of the abrasive cloth. SOLUTION: Dressing is effected by using a dresser 3 constituted such that a dressing material 2 is embedded in an annular state in a disc-form dressing plate 1. In this case, the number of revolutions of the dressing plate 1 based on the number of revolutions of an abrasive cloth 4. In this case, the number of revolutions of the dressing plate 1 to the number of revolutions of the abrasive cloth 4 is decided by formulas I and II, wherein rd and rd1 the radius of the outer periphery and the radius of the inner periphery, respectively, of a dressing plate 1, rcd is the size of a vector from the center of the dressing plate 1 to the center of the dresser 3, rc is the size of a vector from the center of the abrasive cloth 4 to an arbitrary on the dresser 3, and (v) is a relative speed between the dresser 3 and the abrasive cloth 4. Further, dresser 3 is rotated reversely to rotation of the abrasive cloth 4. |
