发明名称 Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method
摘要 The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
申请公布号 US5849369(A) 申请公布日期 1998.12.15
申请号 US19960661734 申请日期 1996.06.11
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OGAWA, KAZUFUMI
分类号 B05D7/24;B01J19/00;B05D1/18;C03C17/30;C08G77/08;C08G77/22;C08G77/24;C09D4/00;C09D183/04;C09D183/08;(IPC1-7):B05D3/06 主分类号 B05D7/24
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