发明名称 |
OVERLAY MARK FOR EXPOSURE ENERGY AND FOCUSING |
摘要 |
An overlay mark for detecting focus and exposure energy during an alignment process for forming a pattern of a semiconductor device is disclosed. The overlay mark includes an inner box and an outer box to concurrently measure exposure energy and focus, wherein, the changes of the exposure energy and the focus are respectively represented by phase shift between the inner and outer boxes in X-axis and Y-axis, the X-axis and the Y-axis representing phase shift respectively to indicate the exposure energy and the focus. |
申请公布号 |
KR0164078(B1) |
申请公布日期 |
1998.12.15 |
申请号 |
KR19950066052 |
申请日期 |
1995.12.29 |
申请人 |
HYUNDAI ELECTRONICS IND. CO.,LTD |
发明人 |
LIM, CHANG-MOON;AHN, CHANG-NAM |
分类号 |
G03F1/08;G03F1/00;G03F1/26;G03F1/44;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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