| 摘要 |
The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, and the cleaner comprises: (a) an effective amount of a least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25 DEG C, and mixtures of such solvents; (b) an effective amount of either at least one anionic surfactant, or a mixture of anionic and nonionic surfactants; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.
|
