发明名称 Schottky diode for integrated circuit
摘要 The Schottky diode is formed in a lightly doped trough (2) of a p-conducting semiconductor substrate (1). As a cathode contact a low ohmic n-conducting layer (12) is provided within the trough and a separate rectifying Schottky contact (5) as the anode (6). A closed p-conducting guard ring (7) is provided extending along the periphery of the Schottky contact. The Schottky contact (5) is formed as a ring around a pn-junction. The pn-junction can be located at the centre of the Schottky contact ring which can be narrow, approx. 1 to 5 fm, preferably 2 to 3 fm
申请公布号 DE19824417(A1) 申请公布日期 1998.12.10
申请号 DE19981024417 申请日期 1998.05.30
申请人 EL MOS ELEKTRONIK IN MOS TECHNOLOGIE GMBH, 44227 DORTMUND, DE 发明人 ROST, WOLFGANG, DIPL.-ING., 44359 DORTMUND, DE
分类号 H01L27/08;H01L29/872;(IPC1-7):H01L29/872;H01L27/082;H01L29/47 主分类号 H01L27/08
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