| 摘要 |
<p>A light-absorbing polymer which contains a light-absorbing coloring matter chemically bonded thereto, has high absorptivity against light rays having specific wavelengths, is excellent in the adhesion to a substrate and the ability to form a thin film, is independent from a resist, and is soluble in solvents for photoresists but becomes insoluble therein through baking; a composition containing this polymer and forming light-absorbing coatings; and light-absorbing coatings (such as antireflection coating) made from the composition. The above polymer is a copolymer at least comprising repeating units derived from a monomer having a keto group and a divalent group (preferably methylene) on the side chain and repeating units derived from a monomer which has an organic chromophore bonded to the backbone chain either directly or through a connecting group and absorbs light rays having specific wavelengths. The light-absorbing coatings (such as antireflection coating) can be formed by dissolving the polymer in a solvent selected from among alcohols, aromatic hydrocarbons, ketones, esters and so on, applying the resulting solution to a wafer, and baking the resulting wafer. Further, a fine resist pattern free from the influence of standing waves can be produced by applying a chemically amplifiable resist on the light-absorbing coating formed above, exposing the resulting laminate to far-ultraviolet rays, and developing it.</p> |
