RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist pattern forming method excellent in workability independently of the stickiness of a photosensitive resin compsn., giving a pattern excellent in resolution and free from a chip and excellent also in yield. SOLUTION: A photosensitive resin compsn. is applied on a substrate and a laminated film consisting of a hydrophobic thermoplastic resin layer and a water-soluble resin layer is pressed on the surface of the photosensitive resin compsn. so that the surface of the water-soluble resin layer comes in contact with the surface of the compsn. The thermoplastic resin layer is then peeled off, a pattern mask is brought into contact with the surface of the exposed water-soluble resin layer, and exposure and development are carried out.