发明名称 WAFER STAGE
摘要 <p>PROBLEM TO BE SOLVED: To improve the reliability and product yields of a semiconductor device by preventing out-of-focusing during exposure due to effect from dust existing on the obverse side of a stage body or on the reverse side of a wafer. SOLUTION: This stage 1 is provided with a stage main body 2 for sucking and holding a wafer placed thereon, and grooves 5 for sucking the wafer are made on the obverse side of the stage body 2. The opening area of the grooves 5 is made larger than the area of contact portions 2a, where the obverse side of the stage body 2 is put into contact with the wafer placed thereon.</p>
申请公布号 JPH10321710(A) 申请公布日期 1998.12.04
申请号 JP19970128136 申请日期 1997.05.19
申请人 SONY CORP 发明人 HIRATA MAKOTO
分类号 H01L21/683;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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