| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and method for deciding a semiconductor mask pattern capable of easily discriminating whether or not an overlapped part of a pattern is an area to be removed when over size is processed and shortening the processing time by instantly moving to the next processing when the overlapped part is discriminated as the area is not required to be removed. SOLUTION: This decision device is provided with a pattern input part 1 inputting a semiconductor mask pattern, an area division part 21 dividing the whole area of the pattern to prescribed sizes, a first calculation part 22 obtaining a minimum total area in the area division part 21, a second calculation part 23 obtaining a maximum total area in the area division part 21, a third calculation part 24 obtaining a total area in the area division part 21, an overlapped part removal part 25 removing it when the overlapped part occurs, a resize processing part 26 performing the resize processing of the pattern, a discrimination part 27 discriminating whether or not a processing part 28 is bypassed and an output part 3 outputting the processing result. |
