| 摘要 |
The present invention relates to a rinse-off antimicrobial cleansing composition comprising from about 0.1% to about 5.0%, by weight of the cleansing composition, of an antimicrobial active; from about 4% to about 18%, by weight of the cleansing composition, of an anionic surfactant, wherein at least about 67% of the anionic surfactant is selected from the group consisting of Class A surfactants, Class C surfactants, and mixtures thereof, wherein the ratio of Class A surfactant to Class C is from about 100:0 to about 1.5:1; from about 0.1% to about 10%, by weight of the cleansing composition, of a Class D acidic surfactants; from 0.1% to about 8%, by weight of the cleansing composition, of a proton donating agent having a Biological Activity Index, Z, of greater than about 0.75, and wherein the proton donating agent is such that the composition is essentially free of C4-C20 alkyl fatty acid; from about 67.0% to about 95.8%, by weight of the cleansing composition, of water; wherein the composition is adjusted to a pH of greater than about 3.0 and less than about 5.5; and wherein the ratio of the amount of non-anionic surfactants to the amount of anionic surfactant is less than 1:1. The invention also encompasses methods for cleansing skin and providing residual effectiveness versus Gram negative bacteria using these products. |
