| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for measuring a line width of an exposure mask capable of reducing a load of a designer and precisely measuring the line width. SOLUTION: Layout data are converted to electron beam data used when plotting by an electron beam is performed (S25), a linear pattern forming instruction having the line width data showing that the line width is zero is retrieved from the layout data (S23), the position data of the linear pattern forming instruction obtained by the retrieval are converted to the electron beam data (S25), a line width measuring position is obtained from the converted position data, the line width measuring designation data containing the line width measuring position is prepared (S27) and the line width of the line width measuring position shown by the line width measuring specification data among the patterns of the exposure mask prepared by performing the plotting with the electron beam based on the electron beam data obtained by converting the layout data is measured (S30).</p> |
