发明名称 |
Maske für Belichtungsgerät zur verkleinernden Projektion |
摘要 |
In a reticle, a small patten including a transparent portion and a large pattern including a light shielding portion are provided on a straight line in parallel to an x or y direction of the pattern forming area in the vicinities of crossing portions of opposite two sides of the pattern forming area with the straight line. A wafer is exposed with this reticle such that centers of the small pattern and the large pattern are overlapped. By measuring relative deviation of the center positions, the in-field error is calculated. <IMAGE> |
申请公布号 |
DE69130407(D1) |
申请公布日期 |
1998.12.03 |
申请号 |
DE1991630407 |
申请日期 |
1991.05.28 |
申请人 |
NEC CORP., TOKIO/TOKYO, JP |
发明人 |
TOMINAGA, MAKOTO, C/O NEC CORPORATION, MINATO-KU, TOKYO, JP |
分类号 |
G03F1/00;G03F1/44;G03F7/20;G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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