发明名称 |
Projection illumination arrangement for Large Scale Integrated Circuit manufacture |
摘要 |
the arrangement has a light source (11) with which a photo mask (20) is illuminated. A diffracted light beam from the photo mask is focussed onto a free-lying substrate (21) via an optical projection system (6) so that a circuit pattern is projected. An optical projection system has a first semi-transparent mirror (1), a first concave mirror (2) for reflecting a light beam reflected or transmitted by the first semi-transparent mirror, a second semi-transparent mirror (3) separate from the first and a second concave mirror (4) for reflecting a light beam reflected or transmitted by the second semi-transparent mirror.
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申请公布号 |
DE19748503(A1) |
申请公布日期 |
1998.12.03 |
申请号 |
DE19971048503 |
申请日期 |
1997.11.03 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP |
发明人 |
KAMON, KAZUYA, TOKIO/TOKYO, JP |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20;G03F1/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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