发明名称 Projection illumination arrangement for Large Scale Integrated Circuit manufacture
摘要 the arrangement has a light source (11) with which a photo mask (20) is illuminated. A diffracted light beam from the photo mask is focussed onto a free-lying substrate (21) via an optical projection system (6) so that a circuit pattern is projected. An optical projection system has a first semi-transparent mirror (1), a first concave mirror (2) for reflecting a light beam reflected or transmitted by the first semi-transparent mirror, a second semi-transparent mirror (3) separate from the first and a second concave mirror (4) for reflecting a light beam reflected or transmitted by the second semi-transparent mirror.
申请公布号 DE19748503(A1) 申请公布日期 1998.12.03
申请号 DE19971048503 申请日期 1997.11.03
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 KAMON, KAZUYA, TOKIO/TOKYO, JP
分类号 G03F7/20;H01L21/027;(IPC1-7):G03F7/20;G03F1/00 主分类号 G03F7/20
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