| 摘要 |
<p>An inventive method for manufacturing an array of M x N thin film actuated mirrors (401) for use in an optical projection system includes the steps of: providing a substrate (310); depositing a thin film sacrificial layer on top of the substrate; creating an array of M x N empty cavities on the thin film sacrificial layer; depositing an elastic layer; patterning the elastic layer into an array of M x N elastic members (335); forming an array of M x N switching device (415) on the substrate (310); depositing a passivation layer (340) and an etchant stopping layer (350); removing the etchant stopping layer and the passivation layer, selectively, such that elastic members (335) are exposed; forming an array of M x N second thin film electrodes (365) and an array of M x N thin film electrodisplacive members (375), successively, on top of each of elastic members (335); forming an array of M x N actuating structures; and removing the thin film sacrificial layer to thereby form the array of M x N thin film actuated mirrors (401). In order to prevent the thermal damage of the active matrix, in inventive method, an array of M x N switching devices (415) are formed on the substrate (310) after all the of high temperature processes are completed, which will, in turn, reduce the possibility of thermal damages occurring on the array of switching devices (415).</p> |
