发明名称 SPUTTERING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an optical disk producing device capable of producing an optical disk small in defects in coating formation by suppressing the generation of arc discharge in a sputtering device and suppressing its influence. SOLUTION: An electrically conductive gap regulating frame 12 is arranged on the outer circumferential part of a target material 9 on a backing plate 10 in the cathode part, and by this regulating frame 12, the difference between the outside diameter of the backing plate 10 and the target material 9 and the space between the backing plate 10 and a dark space shield 11 provided so as to cover the outer circumferential part of the target material 9 are made capable of regulating. In the case the height of the gap regulating frame 12 from the plate 10 is defined as h1 and the thickness of the target material 9 is defined as h2 and, also, in the case the width of the regulating frame 12 is defined as d1 and the difference in the outside diameter between the target material 9 and the plate 10 is defined as d2, h1>=h2 and 0.1×d2<=d1<=d2 are satisfied, by which the rate of defects in coating formation of an optical disk to be generated can be reduced.
申请公布号 JPH10317132(A) 申请公布日期 1998.12.02
申请号 JP19970125160 申请日期 1997.05.15
申请人 SONY CORP 发明人 OTSUKI HIROSHI
分类号 C23C14/34;H01L21/203;(IPC1-7):C23C14/34 主分类号 C23C14/34
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