发明名称 POLISHING METHOD AND POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To detect polishing efficiency on the spot by detecting sliding resistance acting between a polishing pad surface and a semiconductor base board, and also premeasuring the relationship between the sliding resistance and the polishing efficiency. SOLUTION: At polishing, a sliding resistance signal from a load converter 1 is inputted to a personal computer 18 after A/D conversion is performed by an A/D converter 20, and is converted into polishing efficiency from reference data 21 on premeasured sliding resistance and polishing efficiency. A polishing quantity is calculated by integrating this polishing efficiency in polishing time. The calculated polishing quantity is displayed on a display 19, and when it reaches a desired polishing quantity, a stopping signal is sent to a surface plate driving motor controller 17, and a surface plate driving motor 11 is automatically stopped. The polishing efficiency at polishing is also monitored at any time, and when the polishing efficiency reduces more than a prescribed value, a sequence of automatically dressing a polishing pad 5 is performed.
申请公布号 JPH10315124(A) 申请公布日期 1998.12.02
申请号 JP19970126697 申请日期 1997.05.16
申请人 HITACHI LTD 发明人 KOJIMA HIROYUKI;OKAWA TETSUO;SATO HIDEMI;KAYABA NOBUO;NISHIGUCHI TAKASHI
分类号 B24B37/013;B24B37/07;B24B53/017 主分类号 B24B37/013
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